Product specification

Specification overview

Tantalum round target for demanding thin-film deposition applications.

Material
Ta
Purity
99.95%
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Technical information

Product description

Tantalum round target for demanding thin-film deposition applications.

This product can be supplied around the coating process, equipment configuration and operating conditions required by the customer. Product information may cover material composition, target geometry, available dimensions, purity grade, surface condition, machining tolerance and optional backing-plate bonding. Selection should be confirmed together with substrate material, required film properties, deposition rate, process atmosphere, operating power and equipment installation dimensions to support stable, uniform and repeatable coating performance. For research, pilot-scale trials and continuous production, this section can also describe manufacturing methods, quality control, inspection, packaging, storage and customization services. If special drawings, composition ratios, dimensional tolerances or test reports are required, the relevant technical information can be provided during the inquiry so that the material solution, machining requirements and delivery conditions can be reviewed and confirmed.

Tantalum Round Target basic information
Molecular formula
Molar mass
Density
Purity99.95%
Melting point
Boiling point
CAS number